Method for forming micro-electro-mechanical system (MEMS) structure

A pre-cleaning process may be omitted from the eutectic bonding sequence. To remove oxides from one or more surfaces of a device wafer of a micro-electro-mechanical system (MEMS) structure, the duration of an acid-based etch process in a eutectic bonding sequence may be increased relative to the dur...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIN SHENGYUAN, XU XICHENG, GUO HONGDA, ZHOU YINTONG, JI YUANXING, WANG YIXI, YANG ZIPING, ZHAO SHUHAN, WANG XINGYU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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