Method for carrying out structure optimization on metal particle trap in GIS

The invention provides a method for carrying out structure optimization on a metal particle trap in a GIS (Geographic Information System). The method comprises the following steps: inputting structure parameters of a GIS, shape parameters of an insulator, and structure parameters and operation param...

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Hauptverfasser: TIAN KEQIANG, SUN SULIANG, LIU XIANGXING, LI YONGSHENG, LIU HONGLING, NIU SHUOFENG, WANG ZHIJIE, ZHAO JUNLEI, LI ZHENZUO, ZHOU MING, JIA BIN, HAN YANFEI, XU KE, YIN SHOUBIN, LI JIPAN, LI TAO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides a method for carrying out structure optimization on a metal particle trap in a GIS (Geographic Information System). The method comprises the following steps: inputting structure parameters of a GIS, shape parameters of an insulator, and structure parameters and operation parameters of a metal particle trap, and obtaining a characteristic electric field of the bottom of the metal particle trap through a calculation method of the characteristic electric field of the bottom of the metal particle trap based on the input various parameters; obtaining the capture range of the metal particle trap through a calculation method of the capture range of the metal particle trap based on various input parameters; calculating the value of an objective function according to the characteristic electric field and the capture range; optimizing the calculation method of the capture range of the metal particle trap according to the objective function value obj, and obtaining the optimal structure parameter