Exposure device and exposure method

The invention provides an exposure device and an exposure method. The exposure device 3 comprises: a plurality of light irradiating parts 4 for forming a belt-like irradiating region 30 extending from one end to the other end of a surface of a substrate W by irradiating different positions of right...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MINEKAWA YUKIE, NAGAHARA SEIJI, SHIRAISHI GOSUKE, TOMONO MASARU, FUKUNAGA NOBUTAKA
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides an exposure device and an exposure method. The exposure device 3 comprises: a plurality of light irradiating parts 4 for forming a belt-like irradiating region 30 extending from one end to the other end of a surface of a substrate W by irradiating different positions of right and left of the surface of the substrate W respectively independently with light; a rotation mechanism 34 for rotating the substrate W placed on a placement position 33 relative to the irradiating region 30; and a placement part moving mechanism 36 for moving the placement part 33 in the longitudinal direction relative to the irradiating region 30. The substrate W is rotated relative to the irradiating region 30 in which a first illuminance distribution is formed such that an entire surface of the substrate W is exposed. Furthermore, in a state where the rotation of the substrate W is stopped, the substrate is moved in the longitudinal direction relative to the irradiating region 30 in which a second illuminance di