Display device
A display device is provided. The display device comprises a base substrate, a lower interlayer dielectric layer, an oxide semiconductor layer, a first gate insulating layer, a first upper gate electrode, an upper interlayer dielectric layer, a first source electrode and a first drain electrode, whe...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A display device is provided. The display device comprises a base substrate, a lower interlayer dielectric layer, an oxide semiconductor layer, a first gate insulating layer, a first upper gate electrode, an upper interlayer dielectric layer, a first source electrode and a first drain electrode, wherein the oxide semiconductor layer includes a first channel region, a first drain region disposed on one side of the first channel region, and a first source region; the lower interlayer dielectric layer includes a first lower interlayer dielectric layer disposed on the base substrate, and a second lower interlayer dielectric layer disposed on the first lower interlayer dielectric layer; the first lower interlayer dielectric layer includes silicon nitride and the second lower interlayer dielectric layer comprises silicon oxide; a composition ratio of nitrogen to silicon in the first lower interlayer dielectric layer ranges from 0.8 to 0.89.
提供了显示装置。显示装置包括基础衬底、下层间电介质层、氧化物半导体层、第一栅极绝缘层、第一上栅电极、上层间电介质层、第一源电极和第一漏电极,氧化物半导 |
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