Display device

A display device is provided. The display device comprises a base substrate, a lower interlayer dielectric layer, an oxide semiconductor layer, a first gate insulating layer, a first upper gate electrode, an upper interlayer dielectric layer, a first source electrode and a first drain electrode, whe...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SEO KI-SEONG, KIM YOUNG-GYU, YOON HEE-WON, SEO JUNG-YUB, TANAKA TETSUHIRO
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A display device is provided. The display device comprises a base substrate, a lower interlayer dielectric layer, an oxide semiconductor layer, a first gate insulating layer, a first upper gate electrode, an upper interlayer dielectric layer, a first source electrode and a first drain electrode, wherein the oxide semiconductor layer includes a first channel region, a first drain region disposed on one side of the first channel region, and a first source region; the lower interlayer dielectric layer includes a first lower interlayer dielectric layer disposed on the base substrate, and a second lower interlayer dielectric layer disposed on the first lower interlayer dielectric layer; the first lower interlayer dielectric layer includes silicon nitride and the second lower interlayer dielectric layer comprises silicon oxide; a composition ratio of nitrogen to silicon in the first lower interlayer dielectric layer ranges from 0.8 to 0.89. 提供了显示装置。显示装置包括基础衬底、下层间电介质层、氧化物半导体层、第一栅极绝缘层、第一上栅电极、上层间电介质层、第一源电极和第一漏电极,氧化物半导