SUPPORTING AN OPTICAL ELEMENT
The present invention relates to an arrangement of a microlithographic imaging device, particularly for using light in the extreme UV (EUV) range, comprising a holding device (110) for holding an optical element (109), wherein the optical element (109) comprises an optical surface (109.1) and define...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention relates to an arrangement of a microlithographic imaging device, particularly for using light in the extreme UV (EUV) range, comprising a holding device (110) for holding an optical element (109), wherein the optical element (109) comprises an optical surface (109.1) and defines a plane of main extension, in which the optical element (109) defines a radial direction and a circumferential direction. The holding device (110) comprises a base unit (110.1) and more than three separate holding units (110.2), wherein the base unit (110.1) comprises a plurality of support interface units (110.3), which are spaced apart from one another in the circumferential direction, for connecting the holding device (110) to a support structure (102.1). The holding units (110.2) are connected to the base unit (110.1) and disposed in a manner distributed along the circumferential direction and spaced apart from one another. The holding units (110.2) are configured to hold the optical element (109) with respec |
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