Transparent protective film resistant to high-power electromagnetic waves and production method
The invention discloses a transparent protective film resistant to high-power electromagnetic waves and a production method. The production method comprises the following steps of: (1) taking polyethylene glycol terephthalate as a transparent substrate; (2) preparing a dielectric layer by taking 4-c...
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| creator | LIU FENG DAI ZONGLIANG WANG LIPING MA XINHAI DAI ZHONGXIN DENG HAIPU |
| description | The invention discloses a transparent protective film resistant to high-power electromagnetic waves and a production method. The production method comprises the following steps of: (1) taking polyethylene glycol terephthalate as a transparent substrate; (2) preparing a dielectric layer by taking 4-carboxyphenylboronic acid, 3-fluorobromobenzene, trimethyl borate, 2, 6-difluoro-4-bromoaniline, hexadecyl trimethyl ammonium bromide, 4, 4 ', 4' '-(benzene-1, 3, 5-triyltri (acetylene-2, 1-diyl)) triphenylamine, hydrogen fluoride, ferric chloride and silica gel as raw materials; and (3) stacking another layer of transparent substrate on the dielectric layer, and carrying out thermal compounding to obtain the protective film. According to the transparent protective film resistant to the high-power electromagnetic waves and the production method,a fluorine-containing biphenyl structure is formed through the raw materials, a basic structure is formed, an alkyl long chain is introduced, the 4, 4 ', 4''-(benzene-1, 3, 5 |
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The production method comprises the following steps of: (1) taking polyethylene glycol terephthalate as a transparent substrate; (2) preparing a dielectric layer by taking 4-carboxyphenylboronic acid, 3-fluorobromobenzene, trimethyl borate, 2, 6-difluoro-4-bromoaniline, hexadecyl trimethyl ammonium bromide, 4, 4 ', 4' '-(benzene-1, 3, 5-triyltri (acetylene-2, 1-diyl)) triphenylamine, hydrogen fluoride, ferric chloride and silica gel as raw materials; and (3) stacking another layer of transparent substrate on the dielectric layer, and carrying out thermal compounding to obtain the protective film. According to the transparent protective film resistant to the high-power electromagnetic waves and the production method,a fluorine-containing biphenyl structure is formed through the raw materials, a basic structure is formed, an alkyl long chain is introduced, the 4, 4 ', 4''-(benzene-1, 3, 5</description><language>chi ; eng</language><subject>ADHESIVES ; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; CORRECTING FLUIDS ; DYES ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FILLING PASTES ; GENERAL PROCESSES OF COMPOUNDING ; INKS ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PERFORMING OPERATIONS ; POLISHES ; PRINTED CIRCUITS ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; USE OF MATERIALS THEREFOR ; WOODSTAINS ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL ; WORKING-UP</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211217&DB=EPODOC&CC=CN&NR=113811174A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76517</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211217&DB=EPODOC&CC=CN&NR=113811174A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIU FENG</creatorcontrib><creatorcontrib>DAI ZONGLIANG</creatorcontrib><creatorcontrib>WANG LIPING</creatorcontrib><creatorcontrib>MA XINHAI</creatorcontrib><creatorcontrib>DAI ZHONGXIN</creatorcontrib><creatorcontrib>DENG HAIPU</creatorcontrib><title>Transparent protective film resistant to high-power electromagnetic waves and production method</title><description>The invention discloses a transparent protective film resistant to high-power electromagnetic waves and a production method. The production method comprises the following steps of: (1) taking polyethylene glycol terephthalate as a transparent substrate; (2) preparing a dielectric layer by taking 4-carboxyphenylboronic acid, 3-fluorobromobenzene, trimethyl borate, 2, 6-difluoro-4-bromoaniline, hexadecyl trimethyl ammonium bromide, 4, 4 ', 4' '-(benzene-1, 3, 5-triyltri (acetylene-2, 1-diyl)) triphenylamine, hydrogen fluoride, ferric chloride and silica gel as raw materials; and (3) stacking another layer of transparent substrate on the dielectric layer, and carrying out thermal compounding to obtain the protective film. 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The production method comprises the following steps of: (1) taking polyethylene glycol terephthalate as a transparent substrate; (2) preparing a dielectric layer by taking 4-carboxyphenylboronic acid, 3-fluorobromobenzene, trimethyl borate, 2, 6-difluoro-4-bromoaniline, hexadecyl trimethyl ammonium bromide, 4, 4 ', 4' '-(benzene-1, 3, 5-triyltri (acetylene-2, 1-diyl)) triphenylamine, hydrogen fluoride, ferric chloride and silica gel as raw materials; and (3) stacking another layer of transparent substrate on the dielectric layer, and carrying out thermal compounding to obtain the protective film. According to the transparent protective film resistant to the high-power electromagnetic waves and the production method,a fluorine-containing biphenyl structure is formed through the raw materials, a basic structure is formed, an alkyl long chain is introduced, the 4, 4 ', 4''-(benzene-1, 3, 5</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING PASTES GENERAL PROCESSES OF COMPOUNDING INKS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS POLISHES PRINTED CIRCUITS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING USE OF MATERIALS THEREFOR WOODSTAINS WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL WORKING-UP |
| title | Transparent protective film resistant to high-power electromagnetic waves and production method |
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