Transparent protective film resistant to high-power electromagnetic waves and production method

The invention discloses a transparent protective film resistant to high-power electromagnetic waves and a production method. The production method comprises the following steps of: (1) taking polyethylene glycol terephthalate as a transparent substrate; (2) preparing a dielectric layer by taking 4-c...

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Bibliographische Detailangaben
Hauptverfasser: LIU FENG, DAI ZONGLIANG, WANG LIPING, MA XINHAI, DAI ZHONGXIN, DENG HAIPU
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a transparent protective film resistant to high-power electromagnetic waves and a production method. The production method comprises the following steps of: (1) taking polyethylene glycol terephthalate as a transparent substrate; (2) preparing a dielectric layer by taking 4-carboxyphenylboronic acid, 3-fluorobromobenzene, trimethyl borate, 2, 6-difluoro-4-bromoaniline, hexadecyl trimethyl ammonium bromide, 4, 4 ', 4' '-(benzene-1, 3, 5-triyltri (acetylene-2, 1-diyl)) triphenylamine, hydrogen fluoride, ferric chloride and silica gel as raw materials; and (3) stacking another layer of transparent substrate on the dielectric layer, and carrying out thermal compounding to obtain the protective film. According to the transparent protective film resistant to the high-power electromagnetic waves and the production method,a fluorine-containing biphenyl structure is formed through the raw materials, a basic structure is formed, an alkyl long chain is introduced, the 4, 4 ', 4''-(benzene-1, 3, 5