PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER WITH IN SITU CHAMBER CLEANING CAPABILITY

Embodiments of process kit shields and process chambers incorporating same are provided herein. In some embodiments a process kit configured for use in a process chamber for processing a substrate includes a shield having a cylindrical body having an upper portion and a lower portion; an adapter sec...

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Bibliographische Detailangaben
Hauptverfasser:	SONI VAIBHAV, CHONG HALBERT, SUBRAMANI ANANTHA K, HUA ZHONG QIANG, KRANKUMAR NULASANDRA SAVANDREA, KRAUS PHILIP A, GUNG TZA-JING, ZHOU LEI, KALATHIPARAMBIL KISHOR, ALLEN ADOLPH M, FAUNE VANESSA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Embodiments of process kit shields and process chambers incorporating same are provided herein. In some embodiments a process kit configured for use in a process chamber for processing a substrate includes a shield having a cylindrical body having an upper portion and a lower portion; an adapter section configured to be supported on walls of the process chamber and having a resting surface to support the shield; and a heater coupled to the adapter section and configured to be electrically coupled to at least one power source of the processes chamber to heat the shield. 本文提供工艺配件屏蔽物和包含该工艺配件屏蔽物的工艺腔室的实施方式。在一些实施方式中，被配置成用于在工艺腔室中使用以处理基板的工艺配件包括：屏蔽物，该屏蔽物具有圆柱形主体，该圆柱形主体具有上部分和下部分；适配器部分，该适配器部分经配置以被支撑在工艺腔室的壁上并且具有用于支撑屏蔽物的搁置表面；和加热器，该加热器耦接至适配器部分并且经配置以电耦接至工艺腔室的至少一个电源以加热屏蔽物。