GLASS ETCHING SOLUTION AND GLASS SUBSTRATE MANUFACTURING METHOD

[Problem] To provide a liquid crystal panel manufacturing method capable of minimizing the effects of side etching that accompany etching processes. [Solution] A glass etching solution according to the present invention is a glass etching solution for etching glass, said solution including at least...

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Hauptverfasser: FUKA NATSUKI, ISHIGAKI MASAKI, NISHIKAWA HARUKA, SAITO SHUNSUKE, SHIMADA KAZUYA, NAGAI TADASHI, OOKODA KENTA, KASHIWABARA YASUHIRO, FUKUNARI RYOUSUKE, KUME TAKAHIRO, OOYAMA KIYONOBU, MOTOMOCHI TAKESHI, HAYASHI ATSUSHI, MIYOSHI YUZO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:[Problem] To provide a liquid crystal panel manufacturing method capable of minimizing the effects of side etching that accompany etching processes. [Solution] A glass etching solution according to the present invention is a glass etching solution for etching glass, said solution including at least an etching inhibiting substance which lowers the etching speed of glass and contains at least an alkali or a fluorine complex agent. The etching inhibiting substance preferably generates a reaction product which inhibits an etching reaction by attaching to a modified section which has been modified so as to make glass more readily etchable. 本发明提供一种能够将伴随于蚀刻处理的侧蚀刻的影响抑制在最小限度的液晶面板制造方法。本申请发明所涉及的玻璃用蚀刻液是用于对玻璃进行蚀刻的玻璃用蚀刻液,至少含有蚀刻阻碍物质,该蚀刻阻碍物质使对玻璃的蚀刻速度降低,且至少含有碱和氟络合剂中的任一种。蚀刻阻碍物质优选通过附着于玻璃中的改性成容易被蚀刻的改性部来产生阻碍蚀刻反应的反应生成物。