SEMICONDUCTOR DEVICE
A semiconductor device includes a lower electrode on a substrate, a capacitor dielectric film extending on the lower electrode along a side surface of the lower electrode that is perpendicular to the substrate, an upper electrode on the capacitor dielectric film, an interface layer including a hydro...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A semiconductor device includes a lower electrode on a substrate, a capacitor dielectric film extending on the lower electrode along a side surface of the lower electrode that is perpendicular to the substrate, an upper electrode on the capacitor dielectric film, an interface layer including a hydrogen blocking film and a hydrogen bypass film on the upper electrode, the hydrogen blocking film including a conductive material, and a contact plug penetrating the interface layer and electrically connected to the upper electrode.
提供了半导体装置。所述半导体装置包括:下电极,位于基底上;电容器介电膜,在下电极上沿着下电极的与基底垂直的侧表面延伸;上电极,位于电容器介电膜上;界面层,包括位于上电极上的氢阻挡膜和氢旁路膜,氢旁路膜包括导电材料;以及接触插塞,穿透界面层,并且电连接到上电极。 |
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