Multi-layer epitaxial process and linear platform equipment thereof

The invention provides multi-layer epitaxial process linear platform equipment. The equipment comprises a robot vacuum lock capable of horizontally or vertically moving; a plurality of reaction cavities are arranged on the two sides of the robot vacuum lock; and each reaction cavity is provided with a heater, and the robot vacuum lock can put in or take out wafers from the reaction cavities. The equipment improves the productivity flux, is suitable for doping, deposition and other process steps on multiple levels, and can well control the process quality. 本发明提供了多层外延工艺线性平台设备，包括，机器人真空锁可以水平或垂直移动；若干个反应腔排列在机器人真空锁两侧；反应腔具有加热器，机器人真空锁可对反应腔放入或取出晶圆。本发明提高产能通量，适宜在多个层面上进行掺杂、沉积等工艺步骤，可以较佳地控制其工艺质量。