Ternary precursor reaction kettle pH control method

The invention discloses an automatic ternary precursor reaction kettle pH control method. The method comprises the following steps: optimizing a production process, calibrating the relationship between pH correction and particle size, measuring the particle size of a precursor, and correcting pH com...

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Bibliographische Detailangaben
Hauptverfasser: YANG XUFENG, WANG HAIJIE, ZHAO ZHI'AN, YAN XIULIN, YI FEIHONG, ZHENG GANG, QIAN HUA
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses an automatic ternary precursor reaction kettle pH control method. The method comprises the following steps: optimizing a production process, calibrating the relationship between pH correction and particle size, measuring the particle size of a precursor, and correcting pH comprehensive correction and pH. Aiming at small disturbance of a production environment and slow drifting of performance parameters of raw materials, the invention provides the process control method for counteracting the influence of various disturbances, differences and drifting on the particle size by using active correction of pH so as to realize the stability of the performance of a ternary precursor product. The particle size change of D3 can be reduced from 1.5 microns to 0.2 microns, the fluctuation of the particle size distribution of the precursor product is remarkably reduced, the consistency of the particle size distribution of the precursor product in the production process is improved, and the quality o