MACROSCOPIC TEXTURING FOR ANODIZED AND COATED SURFACES

A consumable part for a plasma processing chamber includes a plasma facing side. An engineered surface is formed into the plasma facing side of the consumable part. A plurality of raised features defines the engineered surface, wherein features are arranged in a predefined pattern, and each of the plurality of raised features includes a top region having an outer edge and a sidewall. A base surface of the engineered surface is configured to surround each of the plurality of raised features, such that a corresponding sidewall of a corresponding raised feature extends up at an angle from the base surface to a corresponding top region. The consumable part is configured to be installed in the plasma processing chamber. The consumable part is configured to be exposed to a plasma and by products of the plasma. 一种用于等离子体处理室的易耗部件包含面向等离子体侧。工程化表面被形成于所述易耗部件的所述面向等离子体侧中。多个凸起特征限定所述工程化表面，其中特征按预定图案设置，其中所述多个凸起特征中的每一者包含顶部区域，所述顶部区域具有外缘和侧壁。所述工程化表面的基底表面被配置成围绕所述多个凸起特征的每一者，使得相应凸起特征的相应侧壁从所述基底表面呈一定角度向上延伸至相应顶部区域。所述易耗部件被配置成安装于所述等离子体处理室中