Thin-film photocell design method based on associated random photonic crystal design

The invention discloses a thin-film photocell design method based on associated random photonic crystal design. The method comprises the following steps: (1) preparing a thin-film solar cell pack; (2) drawing a two-dimensional photonic crystal structure on the top of the C-Si layer, and calculating the absorption of the whole stack; (3) selecting and optimizing parameters of the two-dimensional photonic crystal structure; (4) introducing an associated disordered structure by using a perturbation method; (5) simulating solar illumination during normal incidence by adopting non-polarized light, researching the absorption performance of the pseudo-disordered crystal structure by using a strict coupling wave analysis method, and determining a design criterion for increasing the absorption net; (6) randomly generating different disordered structures; (7) forming a pseudo disordered nano pattern; (8) etching by using CHF3 reactive ions, and transferring the organic glass to the SiO2 layer; (9) transferring organic