CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES

Exemplary semiconductor processing chamber showerheads may include a dielectric plate characterized by a first surface and a second surface opposite the first surface. The dielectric plate may define a plurality of apertures through the dielectric plate. The dielectric plate may define a first annular channel in the first surface of the dielectric plate, and the first annular channel may extend about the plurality of apertures. The dielectric plate may define a second annular channel in the first surface of the dielectric plate. The second annular channel may be formed radially outward from the first annular channel. The showerheads may also include a conductive material embedded within the dielectric plate and extending about the plurality of apertures without being exposed by the apertures. The conductive material may be exposed at the second annular channel. 示例性半导体处理腔室喷头可包括介电板，其特征在于第一表面和与第一表面相对的第二表面。介电板可界定穿过介电板的多个孔。介电板可在介电板的第一表面中界定第一环形通道，且第一环形通道可围绕多个孔延伸。介电板可在介电板的第一表面中界定第二环形通道。第二环形通道可以从第一环形通道径向向外形成。喷头还可包括嵌入