V ALLOY TARGET
Provided is a novel V alloy target, wherein the occurrence of irregularities on the surface of the target can be suppressed during the machining of the target, and the deposition of droplets on workpieces can be suppressed while the occurrence of abnormal discharge is suppressed during film formatio...
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Sprache: | chi ; eng |
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Zusammenfassung: | Provided is a novel V alloy target, wherein the occurrence of irregularities on the surface of the target can be suppressed during the machining of the target, and the deposition of droplets on workpieces can be suppressed while the occurrence of abnormal discharge is suppressed during film formation. The V alloy target is composed of V and W, wherein the average value of Vickers hardness on an erosion surface is in the range of 340-750 HV, and the variation in Vickers hardness measured at 5 measurement points is 20% or less. Preferably, the V alloy target has a Vickers hardness in the range of 350-710 HV, and more preferably contains 10-50 at% of W with the remainder comprising V and inevitable impurities.
提供一种新颖的V合金靶,其在靶的机械加工中,可抑制靶表面中的凹凸的产生,可抑制成膜时的异常放电的产生,同时也可达成抑制液滴向被处理材的附着。一种V合金靶,包含V及W,且侵蚀面中的维氏硬度的平均值为340HV~750HV的范围,在5点测定点进行测定而得的维氏硬度的偏差为20%以下,优选为维氏硬度处于350HV~710HV的范围,更优选为含有10原子%~50原子%的W且剩余部分包含V及不可避免的杂质。 |
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