Device, method and equipment for calculating atomic step width of semiconductor substrate and medium

The embodiment of the invention discloses a device, a method and equipment of a semiconductor substrate for calculating atomic step width of a semiconductor substrate and a medium. The semiconductor substrate has an area in which one or more atomic steps are uniformly distributed in parallel, each atomic step is in an inclined state, and the width of the atomic step is the distance between two adjacent atomic steps. The device comprises an image acquisition unit used for determining a test range of a semiconductor substrate and acquiring an atomic step original image corresponding to the semiconductor substrate in the test range; an image processing unit used for carrying out gray processing on the atomic step original image and determining an atomic step gray image; and a calculation unit used for calculating the width of the atomic step according to the distance between two adjacent atomic steps in the atomic step gray level image and the size of the atomic step gray level image. Thus, manpower and material