Copper-based MOF adsorbent for removing NH3 gas and preparation method thereof
The invention discloses a copper-based MOF adsorbent for removing NH3 gas and a preparation method thereof, and relates to the field of synthesis of novel MOF adsorption materials. The adsorbent is obtained by taking copper nitrate and 2-sulfonic terephthalic acid as raw materials and DMF as a solve...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a copper-based MOF adsorbent for removing NH3 gas and a preparation method thereof, and relates to the field of synthesis of novel MOF adsorption materials. The adsorbent is obtained by taking copper nitrate and 2-sulfonic terephthalic acid as raw materials and DMF as a solvent, reacting at 100-120 DEG C for 30-40 hours, and then washing and drying. The copper-based MOF adsorbent is generated through reaction of copper nitrate and 2-sulfonic terephthalic acid,-SO3H is introduced into the copper-based MOF adsorbent for the first time, and a Cu (BDC-SO3H) structure is formed; the MOF material has a three-dimensional pore structure, so that the specific surface area is not lower than that of traditional activated carbon, and the traditional adsorption effect is met; the MOF material is also loaded with -SO3H, the -SO3H can generate chemical bonds with NH3, so that the desorption possibility in the adsorption process is greatly reduced, the adsorption-desorption equilibrium point in the ad |
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