Wax fine and smooth texture polishing glaze and application thereof in ceramic plate

The invention discloses wax fine and smooth texture polishing glaze and application thereof in a ceramic plate. The wax fine and smooth texture polishing glaze comprises the following chemical components in percentage by mass: 45-55% of SiO2, 15-25% of Al2O3, 11-19% of an alkaline earth metal oxide,...

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Bibliographische Detailangaben
Hauptverfasser: XIE ZHIJUN, PANG WEIKE, HU ZHIMIN, WANG XIANCHAO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses wax fine and smooth texture polishing glaze and application thereof in a ceramic plate. The wax fine and smooth texture polishing glaze comprises the following chemical components in percentage by mass: 45-55% of SiO2, 15-25% of Al2O3, 11-19% of an alkaline earth metal oxide, 2-6% of an alkali metal oxide, and 2-4% of ZnO. The wax fine and smooth texture polishing glaze is good in color development and transparency, and low in glossiness after being sintered, so that the wax fine and smooth texture polishing glaze meets the double requirements of touch and vision. 本发明公开一种蜡质细腻质感抛釉及其在陶瓷板中的应用。所述蜡质细腻质感抛釉的化学组成包括:以质量百分比计,SiO2:45-55%;Al2O3:15-25%;碱土金属氧化物:11-19%;碱金属氧化物:2-6%;ZnO:2-4%。所述蜡质细腻质感抛釉的发色和透明度好,烧成后光泽度低,由此符合触觉和视觉的双重要求。