Chemical vapor deposition and annealing continuous process device, method and application

The invention relates to the field of chemical vapor deposition, in particular to a chemical vapor deposition and annealing continuous process device. The device comprises a reaction chamber used for carrying out vapor deposition and annealing steps, a gas valve module used for conveying reaction gas into the reaction chamber, a pressure control module used for discharging process tail gas in the reaction chamber and adjusting the vacuum degree in the reaction chamber and a tail gas circulating module used for purifying the process tail gas conveyed by the pressure control module. A chemical vapor deposition device and an annealing device are simultaneously integrated in the same equipment, so that the cost of purchasing production equipment by an enterprise can be greatly reduced, the production time of a tungsten metal material can be effectively shortened, the production efficiency is improved, the utilization rate of a machine table is improved, the utilization rate of a production raw material can also b