Method for removing p-methoxyphenyl protecting group on amide group
The invention provides a method for removing a p-methoxyphenyl protecting group on an amide group. The method comprises the steps that in the presence of an organic solvent, a substrate and ozone are sequentially subjected to an ozonization reaction and quenching treatment, an oxidation intermediate...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a method for removing a p-methoxyphenyl protecting group on an amide group. The method comprises the steps that in the presence of an organic solvent, a substrate and ozone are sequentially subjected to an ozonization reaction and quenching treatment, an oxidation intermediate is obtained, and an amide group in the substrate is protected through p-methoxyphenyl; and reduction reaction is performed on the oxidation intermediate and carbon monoxide or mixed gas containing carbon monoxide so as to remove p-methoxyphenyl. The substrate and the ozone are subjected to ozonation reaction, quenching is performed a product system of the ozonation reaction, and a reduction reaction is performed on an oxidation intermediate obtained after quenching and carbon monoxide to remove p-methoxyphenyl so as to obtain the required amide organic matter. According to the method for removing the p-methoxyphenyl protecting group on the amide group, thiourea does not need to be used, so that sulfur-containing w |
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