Improved lithographic method

The invention discloses an improved photoetching method. The method comprises the following steps: providing a photomask plate; measuring a placement error of a photoetching mark on the photomask plate; and executing a calibration process of the photoetching process according to the placement error....

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HE XIAOBIN, LI JUNFENG, WANG WENWU, YANG TAO, LIANG SHIYUAN, TIAN FANHUAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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