Unmarked three-dimensional super-resolution microscopy method and device

The invention discloses an unmarked three-dimensional super-resolution microscopic method, which comprises the following steps of: simultaneously performing two-dimensional scanning on an unmarked sample by using a solid illumination light beam and a hollow illumination light beam to obtain a positi...

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Hauptverfasser: KUANG CUIFANG, ZHANG YUSEN, HE MINFEI, LI HAIFENG, ZHOU GUOZUN, LIU XU
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses an unmarked three-dimensional super-resolution microscopic method, which comprises the following steps of: simultaneously performing two-dimensional scanning on an unmarked sample by using a solid illumination light beam and a hollow illumination light beam to obtain a positive confocal reflected light intensity graph obtained by modulating a solid light spot and a negative confocal reflected light intensity graph obtained by modulating a hollow light spot, and carrying out difference calculation; adopting a differential measurement scanning method to perform scanning measurement on a sample to realize axial super-resolution, wherein one photoelectric detector is arranged at a defocus distance-uM position of a focal plane, the other photoelectric detector is arranged at a defocus distance + uM position of the focal plane; measuring intensity curves reflecting sample surface shape changes, performing differential subtraction and normalization processing, and obtaining a differential int