SUBSTRATE RETENTION DEVICE AND SUBSTRATE SUCTIONING METHOD

A substrate retention device has a stage and an intake air conduit. The stage allows a substrate to be placed thereupon and holds the substrate by suctioning the rear surface thereof by vacuum. The intake air conduit is connected to a vacuum pump that performs suction via vacuum. A substrate placement surface of the stage is divided into a plurality of regions. The suction force used for suction via vacuum is configured to be switchable among the respective regions by using valves provided to the intake air conduit so as to correspond to the respective regions. The plurality of regions each have a plurality of fine pores formed therein. 基片保持装置具有工作台和吸气路径。工作台用于载置基片，通过真空吸附基片的背面来保持基片。吸气路径与用于进行真空吸附的真空泵连接。工作台的基片载置面被划分为多个区域。能够使用设置在与多个区域各自对应的吸气路径中的阀，对多个区域各自切换真空吸附用的吸附力。在多个区域分别形成有多个微细孔。