Memory device

A memory device includes a first program line and a second program line. A first portion of the first program line is formed in the first conductive layer, and a second portion of the first program line is formed in the second conductive layer over the first conductive layer. A first portion of the second program line is formed in the first conductive layer. A second portion of the second program line is formed in the second conductive layer. A third portion of the second program line is formed in a third conductive layer over the second conductive layer. The first and second portions of the first program line are different in size from each other, and the first, second, and third portions of the second program line are different in size from each other. 一种存储器件，包括第一程序线和第二程序线。第一程序线的第一部分形成在第一导电层中，并且第一程序线的第二部分形成在第一导电层上方的第二导电层中。第二程序线的第一部分形成在第一导电层中。第二程序线的第二部分形成在第二导电层中。第二程序线的第三部分形成在第二导电层上方的第三导电层中。第一程序线的第一部分和第二部分彼此大小不同，并且第二程序线的第一部分、第二部分和第三部分彼此大小不同。