RADIATION MEASUREMENT SYSTEM

A radiation measurement system (200) comprising an optical apparatus (205) configured to receive a radiation beam (210) and change an intensity distribution of the radiation beam to output a conditioned radiation beam (215), and a spectrometer (220) operable to receive the conditioned radiation beam...

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Bibliographische Detailangaben
Hauptverfasser:	GODFRIED HERMAN PHILIP, OP 'T ROOT WILHELMUS P E M
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A radiation measurement system (200) comprising an optical apparatus (205) configured to receive a radiation beam (210) and change an intensity distribution of the radiation beam to output a conditioned radiation beam (215), and a spectrometer (220) operable to receive the conditioned radiation beam and determine spectral content of the conditioned radiation beam. The radiation measurement system may form part of a lithographic apparatus. 一种辐射测量系统(200)包括被配置为接收辐射束(210)并且改变辐射束的强度分布以输出经调节的辐射束(215)的光学设备(205)、以及可操作以接收经调节的辐射束并且确定经调节的辐射束的光谱含量的光谱仪(220)。辐射测量系统可以形成光刻设备的部分。