Environment temperature compensation method, alignment device and direct-writing imaging photoetching equipment
The invention provides an environment temperature compensation method of an alignment device. The alignment device comprises a camera, a calibration ruler and a platform for fixing the calibration ruler. The environment temperature compensation method comprises the steps of S101, at an environment t...
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| creator | CAI WENTAO QIU TIANSHENG FAN JIHUI |
| description | The invention provides an environment temperature compensation method of an alignment device. The alignment device comprises a camera, a calibration ruler and a platform for fixing the calibration ruler. The environment temperature compensation method comprises the steps of S101, at an environment temperature, aligning a first identification mark on the calibration ruler with a camera view center to obtain a first position of the platform; S102, aligning a second identification mark on the calibration ruler with the center of the visual field of the camera to obtain a second position of the platform; S103, determining the distance between the first identification mark and the second identification mark according to the first position and the second position of the platform; S104, changing the environment temperature, and determining the distance between the first identification mark and the second identification mark at different environment temperatures; and S105, based on the distance between the first iden |
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The alignment device comprises a camera, a calibration ruler and a platform for fixing the calibration ruler. The environment temperature compensation method comprises the steps of S101, at an environment temperature, aligning a first identification mark on the calibration ruler with a camera view center to obtain a first position of the platform; S102, aligning a second identification mark on the calibration ruler with the center of the visual field of the camera to obtain a second position of the platform; S103, determining the distance between the first identification mark and the second identification mark according to the first position and the second position of the platform; S104, changing the environment temperature, and determining the distance between the first identification mark and the second identification mark at different environment temperatures; and S105, based on the distance between the first iden</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211001&DB=EPODOC&CC=CN&NR=113467194A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211001&DB=EPODOC&CC=CN&NR=113467194A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CAI WENTAO</creatorcontrib><creatorcontrib>QIU TIANSHENG</creatorcontrib><creatorcontrib>FAN JIHUI</creatorcontrib><title>Environment temperature compensation method, alignment device and direct-writing imaging photoetching equipment</title><description>The invention provides an environment temperature compensation method of an alignment device. 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The alignment device comprises a camera, a calibration ruler and a platform for fixing the calibration ruler. The environment temperature compensation method comprises the steps of S101, at an environment temperature, aligning a first identification mark on the calibration ruler with a camera view center to obtain a first position of the platform; S102, aligning a second identification mark on the calibration ruler with the center of the visual field of the camera to obtain a second position of the platform; S103, determining the distance between the first identification mark and the second identification mark according to the first position and the second position of the platform; S104, changing the environment temperature, and determining the distance between the first identification mark and the second identification mark at different environment temperatures; and S105, based on the distance between the first iden</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Environment temperature compensation method, alignment device and direct-writing imaging photoetching equipment |
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