SUBSTRATE PROCESSING DEVICE AND SYSTEM, AND METHOD FOR CONTROLLING SUBSTRATE PROCESSING DEVICE AND SYSTEM

The invention provides a substrate processing device and system, and a method for controlling the substrate processing device and system. The substrate processing device includes: a substrate mounting table on which a substrate is mounted; a first high-frequency power source that outputs first high-frequency power of a first frequency to the substrate mounting table; a second high-frequency power source that outputs second high-frequency power of a second frequency lower than the first frequency to the substrate mounting table; and a control part that controls the first high-frequency power source, the first high-frequency power source including a reflected wave detector that detects a reflected wave input from the substrate mounting table, the control part determining a set value in accordance with a processing content, and controlling the first high-frequency power source so that an effective power becomes the set value, the effective power is a difference obtained by subtracting the power of the reflected