MASKING OF CRYSTALLINE SILICON DIOXIDE

MASKING OF CRYSTALLINE SILICON DIOXIDE

A process for treating crystalline silicon dioxide, comprising the step: milling a crystalline silicon dioxide having 0.05 - 1.00 wt.- % of a substance selected from the group consisting of polyvalent alcohols, aluminium alcoholates, kaolin, and mixtures thereof. 一种处理晶体二氧化硅的方法，所述方法包括将晶体二氧化硅与0.05-1.0...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KELLERMANN MAX, ZILLES JORG ULRICH, PAEZ-MALETZ PAUL
Format: Patent
Sprache:chi ; eng
Schlagworte:
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A process for treating crystalline silicon dioxide, comprising the step: milling a crystalline silicon dioxide having 0.05 - 1.00 wt.- % of a substance selected from the group consisting of polyvalent alcohols, aluminium alcoholates, kaolin, and mixtures thereof. 一种处理晶体二氧化硅的方法，所述方法包括将晶体二氧化硅与0.05-1.00％重量的选自下组的物质一起研磨：多元醇、高岭土、铝醇盐，或其组合。