P-channel LDMOS device with surface voltage-resistant structure and preparation method thereof
The invention relates to a p-channel LDMOS device with a surface voltage-resistant structure, and belongs to the technical field of semiconductors. A surface super-junction structure is provided for the p-channel LDMOS device, comb-finger-shaped n-type semiconductor strips are prepared on the surfac...
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Format: | Patent |
Sprache: | chi ; eng |
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