CURABLE FORMULATION WITH HIGH REFRACTIVE INDEX AND ITS APPLICATION IN SURFACE RELIEF GRATING USING NANOIMPRINTING LITHOGRAPHY

Disclosed herein is a nanoimprint lithography (NIL) precursor material comprising a base resin component having a first refractive index ranging from 1.45 to 1.80, and a nanoparticles component having a second refractive index greater than the first refractive index of the base resin component. According to certain embodiments, further disclosed herein are a cured NIL material made by curing the NIL precursor material, a NIL grating comprising the cured NIL material, an optical component comprising the NIL grating, and methods for forming the NIL grating and the optical component using a NIL process. 本文公开了一种纳米压印光刻(NIL)前体材料，该前体材料包含基础树脂组分和纳米颗粒组分，所述基础树脂组分具有在从1.45至1.80的范围内的第一折射率，所述纳米颗粒组分具有大于所述基础树脂组分的所述第一折射率的第二折射率。根据某些实施方案，本文还公开了通过使NIL前体材料固化而制成的固化的NIL材料、包含固化的NIL材料的NIL光栅、包含NIL光栅的光学部件，以及使用NIL工艺来形成NIL光栅和光学部件的方法。