Carbon dioxide-methane plasma high-temperature reforming device and high-temperature reforming method
The invention discloses a carbon dioxide-methane plasma high-temperature reforming device and a high-temperature reforming method. The device comprises a plasma jet device and a cooling device. The method comprises the following steps: a mixed gas of methane and carbon dioxide in a volume ratio of 1...
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Format: | Patent |
Sprache: | chi ; eng |
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