Carbon dioxide-methane plasma high-temperature reforming device and high-temperature reforming method

The invention discloses a carbon dioxide-methane plasma high-temperature reforming device and a high-temperature reforming method. The device comprises a plasma jet device and a cooling device. The method comprises the following steps: a mixed gas of methane and carbon dioxide in a volume ratio of 1...

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Hauptverfasser: SONG SHANG, MENG XIANLIANG, CHU RUIZHI, ZHU ZHUJUN, LI YUSAI, JIANG XIAOFENG, LI WEISONG, LI XIAO, KONG HUIRU, YE ZEFU, WU GUOGUANG, YU SHI
Format: Patent
Sprache:chi ; eng
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