Preparation method of 4D printing NiTi alloy EBSD sample polishing solution, product and application thereof
The invention discloses a preparation method of a polishing solution, a product and application of the polishing solution, and the preparation method comprises the following steps: mixing fumed silica, urea hydrogen peroxide, chitosan oligosaccharide, citric acid and water, and carrying out ultrason...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention discloses a preparation method of a polishing solution, a product and application of the polishing solution, and the preparation method comprises the following steps: mixing fumed silica, urea hydrogen peroxide, chitosan oligosaccharide, citric acid and water, and carrying out ultrasonic stirring treatment for 10-20 minutes to obtain the polishing solution, wherein based on the mass percentage of the polishing solution, the content of the fumed silica is 4-15%, the content of the urea hydrogen peroxide is 4-15%, the content of the chitosan oligosaccharide is 0.5-4%, the content of the citric acid is 0.5-4%, and the balance is distilled water. According to the polishing solution, urea hydrogen peroxide is used as an oxidizing agent, so that the polishing solution has better stability, can be stored for a longer time, and can provide a more stable polishing effect in the polishing process; fumed silica is used as abrasive particles, and compared with common nano-silica, the fumed silica has higher |
---|