Semiconductor element and manufacturing method thereof

The invention discloses a semiconductor element and a manufacturing method thereof. The manufacturing method of a semiconductor element comprises the steps: firstly, providing a substrate which comprises a fin-shaped structure, and then forming a single diffusion isolation structure in the fin-shape...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHUANG FURONG, WANG YUREN, GUO JIAMING, HUANG GUANWEI, LIN JUNXIAN, ZHUANG BOREN, XU QIMAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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