PE-CVD apparatus and method

The embodiment of the invention relates to PE-CVD equipment and a PE-CVD method. According to the present invention, there is provided a capacitively coupled plasma enhanced chemical vapor deposition (PE-CVD) apparatus, comprising: a chamber; a first electrode comprising a substrate support located...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ARCHARD DANIEL, CROOK KATHERINE, ROYLE WILLIAM, MORRISON EUAN ALASDAIR, STEVE BURGESS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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