Method for cleaning micro-nano particle pollutants through laser and application
The invention discloses a method for cleaning micro-nano particle pollutants through laser and application. The method is obtained through a laser cleaning model. The cleaning model is constructed by the following models: an intensity distribution model of light field at a substrate interface includ...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a method for cleaning micro-nano particle pollutants through laser and application. The method is obtained through a laser cleaning model. The cleaning model is constructed by the following models: an intensity distribution model of light field at a substrate interface including a pollutant particle modulation effect, a temperature distribution model at the substrate interface including a non-uniform temperature distribution phenomenon caused by the pollutant particle modulation effect, a thermal stress distribution model at the substrate interface including thermal stress change caused by temperature change and a luminous force distribution model at the substrate interface. By establishing the three-dimensional cleaning model including a scattering light field, a temperature field, a thermal power field and an electromagnetic field, an optimal scheme for cleaning the transparent substrate micro-nano particles can be obtained.
本发明公开了一种激光清洗微纳颗粒污染物的方法和应用。其中所述方法通过激光清洗模型获得,所述清洗模型由以下模型构建而成: |
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