SOLAR CELL PREPARATION METHOD

The present invention relates to a solar cell preparation method. The method comprises the following steps: a polycrystalline silicon layer forming step for forming a polycrystalline silicon layer, containing a first dopant, on the rear surface of a semiconductor substrate which comprises a base region and is formed from a single crystal silicon material; a front surface texturing step for texturing the front surface of the semiconductor substrate and also removing the polycrystalline silicon layer formed on the front surface; a second conductive region forming step for forming a second conductive region by diffusing a second dopant on the front surface of the semiconductor substrate; a passivation film forming step for forming a first passivation film on the polycrystalline silicon layer formed on the rear surface of the semiconductor substrate and forming a second passivation film on the second conductive region on the front surface of the semiconductor substrate; and an electrode forming step for forming a