Method for manufacturing film-forming substrate, film-forming substrate, and surface treatment agent

The invention provides a method for manufacturing a film-forming substrate, a film-forming substrate, and a surface treatment agent. The present invention addresses the problem of providing: a method for producing a film-forming substrate, which is capable of sufficiently improving bleeding of a res...

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Bibliographische Detailangaben
Hauptverfasser: ICHIHASHI TOMOKO, NISHIE KENJI, FUJII TAKUTO, OKA YUKI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a method for manufacturing a film-forming substrate, a film-forming substrate, and a surface treatment agent. The present invention addresses the problem of providing: a method for producing a film-forming substrate, which is capable of sufficiently improving bleeding of a resin composition and adhesion between the resin composition and the surface of a metal substrate; and the like. The present invention provides a method for manufacturing a film-forming substrate in which a film of a resin composition is formed on the surface of a metal substrate, and the like, the method comprising the steps of: an etching step for etching the surface of the metal substrate with a microetchant; a surface treatment step in which a surface treatment agent is brought into contact with the etched surface of the metal substrate to perform surface treatment such that the contact angle of the surface with respect to water is 50-150 DEG; and a film forming step of forming a film of the resin composition on t