Measurement method, exposure method, article manufacturing method, and storage medium

The invention relates to a measurement method, an exposure method, an article manufacturing method, and a storage medium. The measurement method measures a plurality of measurement marks formed in an imaging region on a substrate to which an original pattern is to be transferred. Calculating first position information related to the position of an imaging area on the basis of a measurement value of a first number of measurement marks obtained by executing a first measurement mode for measuring a first number of measurement marks among a plurality of measurement marks formed in the imaging area on a substrate; when a second number of measurement marks smaller than the first number are measured, second position information is predicted for a plurality of models for calculating position information related to the position of the shooting area based on the first position information; obtaining a plurality of first evaluation values for evaluating each of the plurality of models on the basis of the second position