Radio frequency power supply, impedance matching method thereof and semiconductor process equipment

The invention provides a radio frequency power supply, an impedance matching method thereof and semiconductor processing equipment, and relates to the technical field of semiconductor processing. The radio frequency power supply comprises an output module used for generating a radio frequency signal; an acquisition module used for acquiring reflection power and forward power of the radio frequency signal; and a control module used for adjusting the output frequency of the radio frequency signal generated by the output module according to the ratio of the reflection power to the forward power of the radio frequency signal, so that the reflection power of the radio frequency signal with the adjusted output frequency is smaller than a preset threshold value. The response speed of impedance matching of the radio frequency power supply is high, the control precision is high, and the impedance matching efficiency is greatly improved. 本发明提供了一种射频电源及其阻抗匹配方法、半导体工艺设备，涉及半导体加工技术领域。其中，射频电源包括：输出模块，用于生成射频信号；采集模块，用于采集所述射频信号的反