SYSTEMS AND METHODS FOR EXPOSURE CONTROL
The embodiment of the present invention discloses an imaging control method. The method may include the steps of: obtaining a current image generated based on an exposure parameter, wherein the current image includes a plurality of pixels; determining a plurality of target pixels or target pixel gro...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The embodiment of the present invention discloses an imaging control method. The method may include the steps of: obtaining a current image generated based on an exposure parameter, wherein the current image includes a plurality of pixels; determining a plurality of target pixels or target pixel groups from at least portion of the plurality of pixels; determining a statistic representation based on target pixels or target pixel groups; determining a characteristic feature based on the statistic representation; and, updating the exposure parameter, based on the characteristic feature, to generate an updated image.
本申请的实施例披露了一种成像控制方法。所述成像方法可以包括获取基于曝光参数生成的当前图像,所述当前图像可以包括至少两个像素;从所述至少两个像素的至少一部分像素中,确定至少两个目标像素或至少两个目标像素组;基于所述至少两个目标像素或所述至少两个目标像素组确定统计表示;基于所述统计表示,确定特征;以及基于所述特征,改变所述曝光参数以生成更新的图像。 |
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