SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIFORM HEAT OUTPUT

An arrangement of linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top array and a bottom array of linear heat lamps. At least one lamp of the banks includes a filament having a varying density and power output along the length of the lamp. In particular, at least one lamp of the banks includes a filament having a higher filament winding density within a central portion of the lamp relative to peripheral portions of the lamp. In some embodiments, the at least one lamp is a central lamp extending across a central portion of the substrate heated by the lamp. Furthermore, at least one lamp of the banks has a higher power output within a central portion of the lamp than at peripheral portions of the lamp. 提供了线性加热灯的布置，该布置允许在半导体加工期间局部控制衬底中的温度不均匀性。反应器包括定位在线性加热灯的顶部阵列和底部阵列之间的衬底保持件。灯组中的至少一个灯包括灯丝，该灯丝具有沿灯的长度变化的密度和功率输出。特别地，灯组中的至少一个灯包括灯丝，该灯丝在灯的中央部分内具有相对于灯的周边部分较高的灯丝缠绕密度。在一