Cleaning device, cleaning method and drying chamber for cleaning wafer carrier

A cleaning device, a method, and a drying chamber for cleaning a wafer carrier holding a wafer as part of a semiconductor manufacturing process are provided. The cleaning device includes a wet chamber containing a wafer carrier to be washed and a reservoir in fluid communication with the wet chamber. The reservoir stores cleaning fluid introduced into the wafer carrier within the wet chamber during a washing operation, and the drying chamber is spaced apart from the wet chamber. The drying chamber accommodates the wafer carrier after washing the wafer carrier in the wet chamber and holds the wafer carrier during a drying operation. The transfer system transfers the wafer carrier between the wet chamber and the drying chamber during the cleaning process. 提供一种用于清洁保持晶片的晶片载体以作为半导体制造工艺的一部分的清洁设备、方法以及干燥室。清洁设备包含容纳待洗涤的晶片载体的湿室和与湿室流体连通的储集器。储集器存储在洗涤操作期间引入到湿室内的晶片载体的清洁液，且干燥室与湿室间隔开。干燥室在于湿室中洗涤晶片载体之后容纳晶片载体，且在干燥操作期间保持晶片载体。传送系统在清洁工艺期间在湿室与干燥室之间传送晶片载体。