CLEANING LIQUID COMPOSITION AND CLEANING METHOD USING SAME

The present invention relates to a cleaning liquid composition and a cleaning method using same. A polishing slurry composition according to an embodiment of the present invention comprises: a chelating agent containing an organic salt; and an anionic surfactant. 本发明涉及一种洗涤剂组成物及利用其的洗涤方法，根据本发明的一个实施方式的...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG GA-YOUNG, JEONG YONG HO, PARK KUN HEE, KIM YOUNG-GON, YOON YOUNG-HO, YOON YOUNG LOK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	The present invention relates to a cleaning liquid composition and a cleaning method using same. A polishing slurry composition according to an embodiment of the present invention comprises: a chelating agent containing an organic salt; and an anionic surfactant. 本发明涉及一种洗涤剂组成物及利用其的洗涤方法，根据本发明的一个实施方式的抛光浆料组成物包括：包括有机盐的螯合剂、以及阴离子性表面活性剂。