COATED SUBSTRATES WITH ATTACHED DOPANTS COBLASTED WITH PARTICLES AND DOPANT

The present invention is directed to a coated substrate comprising: (a) a surface that has been impacted with an abrasive particle and a dopant such that at least some portion of the surface becomes attached with the dopant; and (b) a film-forming layer on at least a portion of the impacted surface,...

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Bibliographische Detailangaben
Hauptverfasser: KALSANI VENKATESHWARLU, NEDERLOF ARNOLD, VAN DER KOLK KEES, BREON JONATHAN P, MARTIN JOHN J, VELLINGA ARJEN, CONNOR DANIEL, RAKERS NICOLE LYNN, DURGIN KATHERINE M
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The present invention is directed to a coated substrate comprising: (a) a surface that has been impacted with an abrasive particle and a dopant such that at least some portion of the surface becomes attached with the dopant; and (b) a film-forming layer on at least a portion of the impacted surface, wherein the film-forming layer has been deposited from a film-forming composition; wherein the surface is impacted substantially simultaneously with the abrasive particle and the dopant; and wherein when the dopant comprises iron phosphate, zinc phosphate, manganese phosphate, cerium oxide, the film-forming composition is not a two-component epoxy clear coat. 本发明涉及一种经涂覆基底,包含:(a)表面,所述表面已经用磨料颗粒和掺杂剂冲击,使得所述表面的至少某一部分附着有所述掺杂剂;和(b)成膜层,所述成膜层位于受冲击表面的至少一部分上,其中所述成膜层已经由成膜组合物沉积而成;其中所述表面基本上同时用磨料颗粒和掺杂剂冲击;并且其中当掺杂剂包含磷酸铁、磷酸锌、磷酸锰、氧化铈时,成膜组合物不是双组分环氧透明罩漆。