Semiconductor device and manufacturing method thereof

A semiconductor device utilizing an isolation structure between semiconductor regions and a method of manufacture are provided. In an embodiment, different isolation structures are formed between different fins in different regions of different intervals. Some of the isolation structures are formed using a flowable process. The use of such isolation structures helps to prevent damage while also allowing for a reduction in spacing between different fins of the device. 提供了一种利用半导体区域之间的隔离结构的半导体器件以及制造方法。在实施例中，在不同间隔的不同区域的不同鳍之间形成不同的隔离结构。隔离结构中的一些隔离结构使用可流动工艺形成。这种隔离结构的使用帮助防止损坏，同时还允许减小器件的不同鳍之间的间隔。