Multi-element hard film and preparation process thereof
The invention belongs to the technical field of hard film products, and particularly relates to a multi-element hard film and a preparation process thereof. The preparation process of the multi-element hard film comprises the following specific steps of selecting a stainless steel substrate, carryin...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | PAN ZHENQIANG SHI HUAFENG ZHU HUIQIN PAN YOUMING |
description | The invention belongs to the technical field of hard film products, and particularly relates to a multi-element hard film and a preparation process thereof. The preparation process of the multi-element hard film comprises the following specific steps of selecting a stainless steel substrate, carrying out bombardment treatment on the surface of the stainless steel substrate, sputtering and depositing a first film layer Cr layer, sputtering to generate a second film layer CrN layer, sputtering to generate a third film layer CrSiN layer, and sputtering to generate a fourth film layer CrSiCN layer. According to the preparation process of the multi-element hard film, magnetron sputtering and a plasma-assisted chemical vapor deposition process are effectively combined, so that the binding force and the performance of the hard film are greatly improved; besides, the prepared hard film is of a Cr/CrN/CrSiN/CrSiCN multi-element structure, an organic silicon precursor with a certain saturated vapor pressure is adopted |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN113106391A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN113106391A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN113106391A3</originalsourceid><addsrcrecordid>eNrjZDD3Lc0pydRNzUnNTc0rUchILEpRSMvMyVVIzEtRKChKLUgsSizJzM8DsvOTU4uLFUoyUotS89N4GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hobGhgZmxpaGjMTFqANpaLf0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Multi-element hard film and preparation process thereof</title><source>esp@cenet</source><creator>PAN ZHENQIANG ; SHI HUAFENG ; ZHU HUIQIN ; PAN YOUMING</creator><creatorcontrib>PAN ZHENQIANG ; SHI HUAFENG ; ZHU HUIQIN ; PAN YOUMING</creatorcontrib><description>The invention belongs to the technical field of hard film products, and particularly relates to a multi-element hard film and a preparation process thereof. The preparation process of the multi-element hard film comprises the following specific steps of selecting a stainless steel substrate, carrying out bombardment treatment on the surface of the stainless steel substrate, sputtering and depositing a first film layer Cr layer, sputtering to generate a second film layer CrN layer, sputtering to generate a third film layer CrSiN layer, and sputtering to generate a fourth film layer CrSiCN layer. According to the preparation process of the multi-element hard film, magnetron sputtering and a plasma-assisted chemical vapor deposition process are effectively combined, so that the binding force and the performance of the hard film are greatly improved; besides, the prepared hard film is of a Cr/CrN/CrSiN/CrSiCN multi-element structure, an organic silicon precursor with a certain saturated vapor pressure is adopted</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210713&DB=EPODOC&CC=CN&NR=113106391A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210713&DB=EPODOC&CC=CN&NR=113106391A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PAN ZHENQIANG</creatorcontrib><creatorcontrib>SHI HUAFENG</creatorcontrib><creatorcontrib>ZHU HUIQIN</creatorcontrib><creatorcontrib>PAN YOUMING</creatorcontrib><title>Multi-element hard film and preparation process thereof</title><description>The invention belongs to the technical field of hard film products, and particularly relates to a multi-element hard film and a preparation process thereof. The preparation process of the multi-element hard film comprises the following specific steps of selecting a stainless steel substrate, carrying out bombardment treatment on the surface of the stainless steel substrate, sputtering and depositing a first film layer Cr layer, sputtering to generate a second film layer CrN layer, sputtering to generate a third film layer CrSiN layer, and sputtering to generate a fourth film layer CrSiCN layer. According to the preparation process of the multi-element hard film, magnetron sputtering and a plasma-assisted chemical vapor deposition process are effectively combined, so that the binding force and the performance of the hard film are greatly improved; besides, the prepared hard film is of a Cr/CrN/CrSiN/CrSiCN multi-element structure, an organic silicon precursor with a certain saturated vapor pressure is adopted</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD3Lc0pydRNzUnNTc0rUchILEpRSMvMyVVIzEtRKChKLUgsSizJzM8DsvOTU4uLFUoyUotS89N4GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8s5-hobGhgZmxpaGjMTFqANpaLf0</recordid><startdate>20210713</startdate><enddate>20210713</enddate><creator>PAN ZHENQIANG</creator><creator>SHI HUAFENG</creator><creator>ZHU HUIQIN</creator><creator>PAN YOUMING</creator><scope>EVB</scope></search><sort><creationdate>20210713</creationdate><title>Multi-element hard film and preparation process thereof</title><author>PAN ZHENQIANG ; SHI HUAFENG ; ZHU HUIQIN ; PAN YOUMING</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN113106391A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>PAN ZHENQIANG</creatorcontrib><creatorcontrib>SHI HUAFENG</creatorcontrib><creatorcontrib>ZHU HUIQIN</creatorcontrib><creatorcontrib>PAN YOUMING</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PAN ZHENQIANG</au><au>SHI HUAFENG</au><au>ZHU HUIQIN</au><au>PAN YOUMING</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Multi-element hard film and preparation process thereof</title><date>2021-07-13</date><risdate>2021</risdate><abstract>The invention belongs to the technical field of hard film products, and particularly relates to a multi-element hard film and a preparation process thereof. The preparation process of the multi-element hard film comprises the following specific steps of selecting a stainless steel substrate, carrying out bombardment treatment on the surface of the stainless steel substrate, sputtering and depositing a first film layer Cr layer, sputtering to generate a second film layer CrN layer, sputtering to generate a third film layer CrSiN layer, and sputtering to generate a fourth film layer CrSiCN layer. According to the preparation process of the multi-element hard film, magnetron sputtering and a plasma-assisted chemical vapor deposition process are effectively combined, so that the binding force and the performance of the hard film are greatly improved; besides, the prepared hard film is of a Cr/CrN/CrSiN/CrSiCN multi-element structure, an organic silicon precursor with a certain saturated vapor pressure is adopted</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN113106391A |
source | esp@cenet |
subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Multi-element hard film and preparation process thereof |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T06%3A15%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PAN%20ZHENQIANG&rft.date=2021-07-13&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN113106391A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |