MECHANICAL ALIGNMENT OF X-RAY SOURCES

MECHANICAL ALIGNMENT OF X-RAY SOURCES

The present disclosure relates to X-ray sources (100) comprising an electron source (110), an adjustment means (120) for adjusting an orientation of the electron beam (e) generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a...

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Hauptverfasser: KRONSTEDT JOHAN, LUNDSTROM ULF, TAKMAN PER
Format: Patent
Sprache:chi ; eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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creator KRONSTEDT JOHAN
LUNDSTROM ULF
TAKMAN PER
description The present disclosure relates to X-ray sources (100) comprising an electron source (110), an adjustment means (120) for adjusting an orientation of the electron beam (e) generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor (130) arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller (140) that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. The present disclosure also relates to X-ray sources (100) comprising a target orientation sensor (270) and a target adjustment means (280), wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target. 本披露内容涉及X射线源(100)，这些X射线源包括电子源(110)、用于调节由该电子源生成的电子束(e)的取向的调节装置(120)、被配置为根据聚焦设置聚焦电子束的聚焦装置、被布置为生成指示电子束相对于靶标位置的取向的信号的束取向传感器(130)、以及可操作地连接到该聚焦装
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN113039625A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN113039625A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN113039625A3</originalsourceid><addsrcrecordid>eNrjZFD1dXX2cPTzdHb0UXD08XT383X1C1Hwd1OI0A1yjFQI9g8NcnYN5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hobGBsaWZkamjsbEqAEAi_gjFg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MECHANICAL ALIGNMENT OF X-RAY SOURCES</title><source>esp@cenet</source><creator>KRONSTEDT JOHAN ; LUNDSTROM ULF ; TAKMAN PER</creator><creatorcontrib>KRONSTEDT JOHAN ; LUNDSTROM ULF ; TAKMAN PER</creatorcontrib><description>The present disclosure relates to X-ray sources (100) comprising an electron source (110), an adjustment means (120) for adjusting an orientation of the electron beam (e) generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor (130) arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller (140) that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. The present disclosure also relates to X-ray sources (100) comprising a target orientation sensor (270) and a target adjustment means (280), wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target. 本披露内容涉及X射线源(100)，这些X射线源包括电子源(110)、用于调节由该电子源生成的电子束(e)的取向的调节装置(120)、被配置为根据聚焦设置聚焦电子束的聚焦装置、被布置为生成指示电子束相对于靶标位置的取向的信号的束取向传感器(130)、以及可操作地连接到该聚焦装</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; X-RAY TECHNIQUE</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210625&amp;DB=EPODOC&amp;CC=CN&amp;NR=113039625A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20210625&amp;DB=EPODOC&amp;CC=CN&amp;NR=113039625A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KRONSTEDT JOHAN</creatorcontrib><creatorcontrib>LUNDSTROM ULF</creatorcontrib><creatorcontrib>TAKMAN PER</creatorcontrib><title>MECHANICAL ALIGNMENT OF X-RAY SOURCES</title><description>The present disclosure relates to X-ray sources (100) comprising an electron source (110), an adjustment means (120) for adjusting an orientation of the electron beam (e) generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor (130) arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller (140) that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. The present disclosure also relates to X-ray sources (100) comprising a target orientation sensor (270) and a target adjustment means (280), wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target. 本披露内容涉及X射线源(100)，这些X射线源包括电子源(110)、用于调节由该电子源生成的电子束(e)的取向的调节装置(120)、被配置为根据聚焦设置聚焦电子束的聚焦装置、被布置为生成指示电子束相对于靶标位置的取向的信号的束取向传感器(130)、以及可操作地连接到该聚焦装</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>X-RAY TECHNIQUE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD1dXX2cPTzdHb0UXD08XT383X1C1Hwd1OI0A1yjFQI9g8NcnYN5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hobGBsaWZkamjsbEqAEAi_gjFg</recordid><startdate>20210625</startdate><enddate>20210625</enddate><creator>KRONSTEDT JOHAN</creator><creator>LUNDSTROM ULF</creator><creator>TAKMAN PER</creator><scope>EVB</scope></search><sort><creationdate>20210625</creationdate><title>MECHANICAL ALIGNMENT OF X-RAY SOURCES</title><author>KRONSTEDT JOHAN ; LUNDSTROM ULF ; TAKMAN PER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN113039625A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>X-RAY TECHNIQUE</topic><toplevel>online_resources</toplevel><creatorcontrib>KRONSTEDT JOHAN</creatorcontrib><creatorcontrib>LUNDSTROM ULF</creatorcontrib><creatorcontrib>TAKMAN PER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KRONSTEDT JOHAN</au><au>LUNDSTROM ULF</au><au>TAKMAN PER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MECHANICAL ALIGNMENT OF X-RAY SOURCES</title><date>2021-06-25</date><risdate>2021</risdate><abstract>The present disclosure relates to X-ray sources (100) comprising an electron source (110), an adjustment means (120) for adjusting an orientation of the electron beam (e) generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor (130) arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller (140) that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. The present disclosure also relates to X-ray sources (100) comprising a target orientation sensor (270) and a target adjustment means (280), wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target. 本披露内容涉及X射线源(100)，这些X射线源包括电子源(110)、用于调节由该电子源生成的电子束(e)的取向的调节装置(120)、被配置为根据聚焦设置聚焦电子束的聚焦装置、被布置为生成指示电子束相对于靶标位置的取向的信号的束取向传感器(130)、以及可操作地连接到该聚焦装</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
title MECHANICAL ALIGNMENT OF X-RAY SOURCES
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