MECHANICAL ALIGNMENT OF X-RAY SOURCES
The present disclosure relates to X-ray sources (100) comprising an electron source (110), an adjustment means (120) for adjusting an orientation of the electron beam (e) generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present disclosure relates to X-ray sources (100) comprising an electron source (110), an adjustment means (120) for adjusting an orientation of the electron beam (e) generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor (130) arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller (140) that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. The present disclosure also relates to X-ray sources (100) comprising a target orientation sensor (270) and a target adjustment means (280), wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.
本披露内容涉及X射线源(100),这些X射线源包括电子源(110)、用于调节由该电子源生成的电子束(e)的取向的调节装置(120)、被配置为根据聚焦设置聚焦电子束的聚焦装置、被布置为生成指示电子束相对于靶标位置的取向的信号的束取向传感器(130)、以及可操作地连接到该聚焦装 |
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